UI - Tesis Membership :: Kembali

UI - Tesis Membership :: Kembali

Determination of thin films thickness by tolansky interferometry

Farid Wadjdi Machmud; Kuswinardi Tedjojuwono, supervisor (Fakultas Teknik Universitas Indonesia, 1986)

 Abstrak

A computerized interference pattern analysis has been developed for analyzing an interference pattern produced by the Tolansky interferometric arrangement. The purpose of the analysis is to obtain informations about the thickness of thin films deposited on smooth non-planar substrate. An approximation scheme employing the combination of Taylor expansion and Binomial theorem up to the third order has been developed along with the computer program which is shown to produce better result than the previous second order approximation. A simple prototype interferometer has been built for the measurement and the application of the analysis scheme. A discussion is given on the experimental and calculational aspects which are related to the accuracy of determination of the film thickness.

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 Metadata

Jenis Koleksi : UI - Tesis Membership
No. Panggil : T-Pdf
Entri utama-Nama orang :
Entri tambahan-Nama orang :
Program Studi :
Subjek :
Penerbitan : Depok: Fakultas Teknik Universitas Indonesia, 1986
Bahasa : eng
Sumber Pengatalogan :
Tipe Konten : text
Tipe Media : computer
Tipe Carrier : online resource
Deskripsi Fisik : iii, 42 pages ; 28 cm + appendix
Naskah Ringkas :
Lembaga Pemilik : Universitas Indonesia
Lokasi : Perpustakaan UI, Lantai 3
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No. Panggil No. Barkod Ketersediaan
T-Pdf 15-19-299130632 TERSEDIA
Ulasan:
Tidak ada ulasan pada koleksi ini: 20316814
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