Glow discharge processes: sputtering and plasma etching / Brian Chapman
Chapman, Brian;
(John Wiley and Sons, 1980)
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| Jenis Koleksi : | Buku Teks SO |
| No. Panggil : | 537.52 CHA g;537.52 CHA g (2) |
| Entri utama-Nama orang : | |
| Subjek : | |
| Penerbitan : | New York: John Wiley and Sons, 1980 |
| Sumber Pengatalogan : | |
| ISBN : | [047107828X;047107828X] |
| Tipe Konten : | |
| Tipe Media : | |
| Tipe Carrier : | |
| Edisi : | [;, ] |
| Deskripsi Fisik : | xv, 406 p. : ill. ; 23 cm. |
| Catatan Bibliografi : | Bibliographies in each chapter |
| Catatan Seri : | A Wiley-Interscience publication |
| Catatan Umum : | |
| Catatan Versi Asli : | |
| Lembaga Pemilik : | Universitas Indonesia |
| Lokasi : | Perpustakaan UI, Lantai 2 |
| No. Panggil | No. Barkod | Ketersediaan |
|---|---|---|
| 537.52 CHA g;537.52 CHA g (2) | 01-10-04014403 | TERSEDIA |
| 537.52 CHA g;537.52 CHA g (2) | 01-13-017182 | TERSEDIA |
| Ulasan: |
| Tidak ada ulasan pada koleksi ini: 20342138 |
