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Chemical vapor deposition

edited by Jong-Hee Park, T.S. Sudarshan (ASM International, 2001)

 Abstrak

This handbook provides guidelines and practical information on the chemical vapor deposition (CVD) process for surface engineering design, product development, and manufacturing. The first of the 14 chapters discuss the basic principles of CVD thermodynamics and kinetics, stresses and mechanical.

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 Metadata

Jenis Koleksi : eBooks
No. Panggil : e20442202
Entri utama-Nama orang :
Entri tambahan-Nama orang :
Subjek :
Penerbitan : Materials Park, OH: ASM International, 2001
Sumber Pengatalogan: LibUI eng rda
Tipe Konten: text
Tipe Media: computer
Tipe Pembawa: online resource
Deskripsi Fisik: vii, 481 pages : illustration
Tautan: http://portal.igpublish.com/iglibrary/search/ASMIB0000032.main.html?7
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