Indium tin oxide (ITO) films have been prepared by do magnetron sputtering with different partial oxygen pressure from 4 mPa to 32 mPa and different of sputter power. The thickness of ITO films were found to be 529 nm - 796 nm. The effects of oxygen partial pressure and sputtering power on the optical properties of ITO films are investigated. From transmittance and reflectance spectra from 350 nm to 800 nm, we can determined the optical parameters by the minimal function method. A visible transmission of - 90% is obtained for 10 mPa oxygen partial pressure. The real refractive index n of ITO films and the energy gap were found 2.04 - 2.22 at λ 550 nm and 2.99 eV - 3.14 eV, respectively. Typical values for the extinction coefficient k at visible range were found to be 7x 10-4 - 7x10-2.

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Lapisan indium timah oksida (ITO) telah dibuat dengan proses dc magnetron sputtering dengan tekanan parsial oksigen yang diubah-ubah dari 4 mPa - 32 mPa dan daya sputtering yang berbeda. Ketebalan lapisan ITO yang didapat berkisar antara 529 nm - 796 nm. Dilakukan studi mengenai pengaruh tekanan parsial oksigen serta pengaruh daya sputtering pada sifat optis lapisan tipis ITO. Dari spektrum reflektansi dan transmitansi diantara 350 nm - 800 nm, didapat parameter-parameter optis ITO dengan menggunakan metode fungsi minimal. Untuk tekanan parsial oksigen 10 mPa didapat nilai transmisi cahaya tampak 90% Nilai index bias real n lapisan ITO dan besar celah pita energi berturut-turut adalah 2,04 - 2,22 pada λ 550 nm dan 2,99 eV - 3,14 eV. Nilai index bias imajiner k yang didapat adalah 7x 10-4 - 7x10-2.