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"Jenis kecenderungan ikatan lokal atomik lapisan tipis amorf silikon karbon terhidrogenasi (a-Sit-rCx: H) hasil deposisi sputtering dengan target grafit dan silikon telah ditentukan dengan menggunakan prosedur minimasi. Prosedur minimasi dilakukan terhadap fungsi dielektrik kompleks hasil eksperimen dengan fungsi dielektrik kompleks model tetrahedron yang dikembangkan oleh Mui-Smith. Lapisan tipis a-Si1-xC1:H yang dihasilkan dengan target grafit memiliki kecenderungan ikatan lokal atomik CD (chemically disordered) sedangkan hasil dart target silikon memiliki jenis kecenderungan ikatan lokal atomik CORD (chemical ordering with homogeneous dispersion). Kehadiran void pada lapisan tipis a-Si1-xCx: H untuk kedua jenis target juga dapat diketahui dari prosedur minimasi. Jumlah void yang cenderung konstan pada lapisan tipis yang dihasilkan dengan target grafit mendukung hasil para peneliti lain bahwa jumlah void bukan dipengaruhi oleh peningkatan konsentrasi karbon tetapi karena peningkatan hydrogen. Lapisan tipis yang dihasilkan dengan menggunakan target grafit memiliki jumlah void yang lebih tinggi dibandingkan lapisan tipis yang dihasilkan dart target silikon atau lapisan tipis yang dihasilkan dengan target silikon lebih kompak dibandingkan hasil target grafit.

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Determination of Local Atomic Bonding Preferences of Amorphous Silicon Carbon Deposited by 2 Sputtering Targets : Graphite and Silicon. The preferences of local atomic bonding of amorphous silicon carbon films deposited by graphite and silicon target has been determined by minimizing procedure. The experimental complex dielectric function has been minimized by complex dielectric function model developed by Mui-Smith. The preferences of local atomic bonding for films deposited by graphite target was chemically disordered (CD) whereas for films deposited by silicon target was chemical ordering with homogeneous dispersion (COHD). Minimization procedure shows the presence of voids in the films for both silicon and graphite targets. The monotonic behavior of voids with carbon concentration for films deposited by graphite target agree with other's researcher results that the amounts of void are not influenced by increasing carbon concentration but are influenced by hydrogen concentration. The films deposited by graphite target contain more voids than silicon target or films deposited by silicon target have a compact structure than graphite target."

"Expert techniques for extracting hydrogen from water using transition metal oxides as catalysts Solar Hydrogen Generation details the complex process of separating hydrogen from oxygen--photoelectrolysis. This book comprehensively covers the chemical characteristics of transition metal oxides, explaining how to covert solar energy to electron energy through transition metal oxides. Past experimentations and future directions are discussed. Solar Hydrogen Generation Comprehensively reviews physical characteristics of transition metal oxides both in electrochemical and photocatalytic applications Includes history and future prospects for water photoelectrolysis Reviews state-of-the-art achievements in the fields of condensed matter physics, nanostructured material science, electrochemistry, and photocatalysis Addresses potential problems and solutions In-depth coverage: Hydrogen Production; Electrochemistry and Photoelectrolysis; Transition Metal Oxides; Molecular Structure, Crystal Structure, and Electronic Structure; Optical Properties and Light Absorption; Bandgap, Band Edge, and Engineering; Impurity, Dopants, and Defects; Photocatalytic Reactions, Oxidation and Reduction; Organic and Inorganic Systems; Surface and Interface Chemistry; Nanostructured and Morphology; Synchrotron Radiation and Soft X-Ray Spectroscopy"--Provided by publisher."This pioneering guide covers one of the most promising sustainable energy carriers--water hydrogen--and shows how to extract hydrogen from water using transition metal oxides as catalyst."