Chemical vapor deposition
edited by Jong-Hee Park, T.S. Sudarshan (ASM International, 2001)
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| This handbook provides guidelines and practical information on the chemical vapor deposition (CVD) process for surface engineering design, product development, and manufacturing. The first of the 14 chapters discuss the basic principles of CVD thermodynamics and kinetics, stresses and mechanical. |
 Chemical vapor deposition.pdf :: Unduh
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| No. Panggil : | e20442202 |
| Entri utama-Nama orang : | |
| Entri tambahan-Nama orang : | |
| Subjek : | |
| Penerbitan : | Materials Park, OH: ASM International, 2001 |
| Sumber Pengatalogan: | LibUI eng rda |
| Tipe Konten: | text |
| Tipe Media: | computer |
| Tipe Pembawa: | online resource |
| Deskripsi Fisik: | vii, 481 pages : illustration |
| Tautan: | http://portal.igpublish.com/iglibrary/search/ASMIB0000032.main.html?7 |
| Lembaga Pemilik: | |
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| No. Panggil | No. Barkod | Ketersediaan |
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| e20442202 | TERSEDIA |
| Ulasan: |
| Tidak ada ulasan pada koleksi ini: 20442202 |
