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Eric Jobiliong, author

Indium tin oxide (ITO) films have been prepared by do magnetron sputtering with different partial oxygen pressure from 4 mPa to 32 mPa and different of sputter power. The thickness of ITO films were found to be 529 nm - 796 nm. The effects of oxygen partial pressure and sputtering...

Depok: Universitas Indonesia, 1999

T17289

UI - Tesis Membership  Universitas Indonesia Library

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